Extreme ultraviolet lithography (EUVL) has emerged as a cornerstone technology in the semiconductor industry, enabling the production of devices with sub-10 nm feature sizes. By utilising a 13.5 nm ...

CU Boulder researchers have built high-performing optical microresonators, opening the door for new sensor technologies. At its simplest form, a microresonator is a tiny device that can trap light and ...

Electron projection lithography (EPL) is moving out of the R&D lab and into manufacturing evaluation sites, according to chip consortiums International Sematechr and Selete. That’s the word from the ...

This article presents a method for developing elastic nanoarchitected metamaterials with tunable optical responses.

Home > Press release: Dr. Andreas Erdmann from Fraunhofer IISB ...

Building an integrated circuit (IC) requires various physical and chemical processes to be performed on a semiconductor (e.g., silicon) substrate. Millions of transistors can be fabricated and wired ...

Canon has developed a new approach to lithography that reduces costs and energy consumption compared to ASML's EUV systems. Canon's new nanoimprint lithography machine imprints circuit patterns "like ...

Canon launched its Nanoimprint Lithography semiconductor manufacturing equipment, which has the potential to compete with ASML's EUV technology currently in production at 4nm. Canon's first planned ...

Researchers review AI-powered inverse lithography, showing how deep learning boosts chip patterning precision and efficiency while facing scaling challenges. Computational lithography optimizes the ...

Few would expect the future of artificial intelligence (AI) to depend on Eindhoven, a quiet Dutch town. Yet just beyond its borders sits the headquarters of ASML, the only company that makes the ...